基本简介

职称：教授

学位：博士

毕业学校：普渡大学（美国）

主要兼职：

电子邮件：xibin3@mail.sysu.edu.cn

个人主页：

学历

本科：南开大学 中国

硕士：

博士：普渡大学 美国

学术经历

博士后：哈佛大学 美国

学科方向

所在学科：材料物理与化学

研究方向：原子层沉积 (Atomic Layer Deposition) 和原子层刻蚀（Atomic Layer Etching）的前驱体和工艺

研究兴趣：

学术业绩

荣誉获奖

代表论著

1. Atomic Layer Deposition of CoxOy films: Oxidants vs Composition, Advanced Materials Interfaces, 2022, in press.

2. Preliminary Growth of Metallic Co Films by Thermal Atomic Layer Deposition using RCpCo(CO)2 and Alkylamine Precursors, Materials Letters, 2022, 311, 131605.

3. A CoN-based OER Electrocatalyst Capable in Neutral Medium: Atomic Layer Deposition as Rational Strategy for Fabrication, Advanced Functional Materials, 2021, 31, 2101324.

4. TiN@Co5.47N Composite Material Constructed by Atomic Layer Deposition as Reliable Electrocatalyst for Oxygen Evolution Reaction, Advanced Functional Materials, 2021, 31, 2008511.

5. Strategic Atomic Layer Deposition and Electrospinning of Cobalt Sulfide/Nitride Composite as Efficient Bifunctional Electrocatalysts for Overall Water Splitting, Small, 2020, 16, 2002432.

6. Ni3S2 Anchored to N/S co-Doped Reduced Graphene Oxide with Highly Pleated Structure as a Sulfur Host for Lithium-Sulfur Batteries, Journal of Materials Chemistry A, 2020, 8, 3834.